Micromechanical resonators have the potential to replace quartz crystals for timing and frequency references, resonant mass sensing, gyroscopes and RF filter applications owing to their small form factors, better aging stability and CMOS scalability. Resonator design involves engineering and optimizing several performance characteristics such as quality factor, frequency stability, actuation and sensing mechanism and packaging. In this talk, I will go over my individual research along with collaborative work that I carried out as part of a team that worked on a DARPA project on micromechanical resonators. I will talk about energy loss mechanisms that dictate the observed quality factor of resonators with focus on Akhieser effect and Thermoelastic dissipation. I will also expound on underlying causes for frequency instability at short, medium and long term, compensation schemes for the frequency instabilities and implementation of the same. Finally, I will bring up some of the open problems that need to be addressed in this field and scope for future work. In addition, I have conducted research as a postdoctoral fellow in the area of Nanoimprint Lithography with application for optical phased arrays and as an engineer in an R&D group that builds production worthy systems to solve emergent problems for future technology nodes in Intel Mask Organization. I will end the talk with a quick summary of this research work.
Dr. Saurabh Arun Chandorkar received his BTech from IIT Bombay and Ph.D. in Mechanical Engineering with a minor in Electrical Engineering from Stanford University. Having being awarded Graduate Engineering Fellowship from Stanford University, he completed his PhD in Mechanical Engineering with a minor in Electrical Engineering from Stanford University in 2009. His dissertation entitled “Energy Loss Mechanisms in Micromechanical Resonators” focused specifically on the study of thermoelastic dissipation and the Akhieser effect in micromechanical resonators. He has published over 20 journal and 30 conference papers and holds 2 patents in the field of micromechanical resonators. He worked as a postdoctoral fellow in the area of adaptive Nanoimprint lithography in the Electrical Engineering Department of Stanford University. He currently works in a R&D group in Intel Mask Organization. His present work involves building complete production worthy systems for upcoming technologies starting from research at concept level to actual implementation of all the mechanical, electronics and software aspects of the system. He has been awarded two Intel Logic Technology Development (LTD) Divisional awards in last 5 years.