This talk describes silicon photodiodes with silicon dioxide and metal-silicide front entrance window developed for scientific, space and industrial applications. Due to their unique features, the oxide window photodiodes (AXUV series, one Grad oxide hardness) have been approved by International laboratories like NIST and PTB as transfer standards in the UV, vacuum UV and extreme UV range. .The AXUV devices have been successfully used in the European SOHO and Coronas-Photon, and American SNOE, SORCE, GOES, TIMED and EOS solar space instrumentation. An AXUV multi-element diode array has been successfully used in the Ring Accelerator Experiment (RACE) at Lawrence Livermore National Laboratory and also by other fusion research laboratories around the world to obtain radiated power vs. length and radius profiles of the plasma. A four channel compact neutral particle analyzer using AXUVHS5 photodiodes was used to observe 50 to 350 keV hydrogen neutrals. Several quadrant AXUV diodes with central holes and rectangular slit openings have been built specifically for synchrotron beam intensity monitoring and position sensing. For much higher radiation hardness, photodiodes with metal-silicide front window (SXUV series) were developed which showed no responsivity change after exposure to 244 nm CW laser with 8.5 W/cm2 power density and a billion 100 μJ/cm2 pulses from both 193 nm and 157 nm excimer lasers. This makes possible their use for intensity monitoring of high power CW UV sources, excimer lasers and 13 nm sources being developed for EUV lithography.
Raj Korde received his BE, M.Tech and Ph.D. all in Electrical Engineering from VRCE, Nagpur, IIT Bombay and IIT Kanpur respectively. He was an Assistant Professor at University of Campinas Brazil and later Member of Technical Staff at United Detector Technology, Hawthorne California, USA. He founded International Radiation Detectors and operated successfully for 19 years before it was purchased by ITW Corp. Chicago Illinois. He has over a dozen well cited publications and two patents.