Building on the global momentum in thin-film technologies, we are delighted to host the International Workshop on Atomic Layer Deposition: Materials-to-Manufacturing (ALD-M2M 2026) at IIT Bombay, India.

As India’s first international workshop dedicated to Atomic Layer Deposition (ALD), ALD-M2M 2026 envisions building a vibrant ecosystem that connects fundamental research with industrial-scale manufacturing. Hosted at IIT Bombay, this three-day forum will bring together leading researchers, students, process engineers, equipment and precursor developers, industry professionals, and technology innovators to exchange ideas across the complete ALD value chain—from novel chemistries and atomic-scale process control to advanced characterization, device integration, and high-volume production. Alongside ALD fundamentals and manufacturing applications, the workshop will spotlight emerging areas and special topics, including Atomic Layer Etching (ALE), Area-Selective Deposition (ASD), computational ALD, and other cutting-edge technologies.

The workshop’s mission is to accelerate knowledge exchange, foster academia–industry partnerships, and identify pathways for translating laboratory breakthroughs into scalable technologies. Participants will gain insights into emerging research directions, practical manufacturing challenges, and commercialization opportunities while building valuable connections with experts from India and across the world. Whether you are exploring ALD fundamentals, developing next-generation materials and devices, or seeking scalable solutions for semiconductor and advanced manufacturing, ALD-M2M 2026 offers a unique platform to learn, collaborate, and help shape the future of atomic-scale manufacturing in India.