Development of 5-Micron CMOS Metal Gate Technology

Project Detail: Development of 5-Micron CMOS Metal Gate Technology: At Solid State Electronics Group of Tata Institute of Fundamental Research, Semiconductor Complex Ltd was initiated and I was one of the members of Technical Team which successfully fabricated First CMOS Chip under guidance of Prof. K.V.Ramanathan. My major contribution was in developing a New Pyrogenic System for growth of low oxide charge Field- Oxide. I also standardised HCL grown Gate Oxide technology then.